Article
  • Fabrication of Microstructures Using Double Contour Scanning (DCS) Method by Two-Photon Polymerization
  • Park SH, Lim TW, Lee SH, Yang DY, Kong HJ, Lee KS
  • 이광자 광중합의 윤곽선 스캐닝법에 의한 마이크로 입체형상 제작
  • 박상후, 임태우, 이상호, 양동열, 공홍진, 이광섭
Abstract
A nano-stereolithography (NSL) apparatus has been developed for fabrication of microstructures with the resolution of 150 nanometers. In the NSL process, a complicated 3D structure can be fabricated by building layer by layer, so it does not require any sacrificial layer or any supporting structure. A laminated layer was fabricated by means of solidifying liquid-state monomers using two-photon absorption (TPA) which was induced by a femtosecond laser. When the fabrication of a 3D laminated structure was finished, unsolidified liquid-stage resins were removed to develop the fabricated structure by dropping several droplets of solvent, then the polymerized structure was only left on the glass substrate. A microstructure is fabricated by vector scanning method to save the fabrication time. The shell thickness of a structure is very thin within 200 nm, when it is fabricated by a single contour scanning (SCS) path. So, a fabricated structure can be deformed of a shell typed structure, and a microcup was fabricated to show the usefulness of the developed NSL system and the DCS method.

본 연구는 수십 마이크로미터 크기의 임의의 3차원 형상제작을 위한 이광자 광중합에 의한 나노 입체 리소그래피(nano-stereolithography) 공정개발에 관한 것이다. 본 연구에서 제안한 공정은 3차원 CAD 파일을 이용하여 형상의 윤곽선을 고화시켜서 연속적으로 적층하여 구조물을 제작하는 공정으로 기존의 리소그래피 공정과 달리 복잡한 형상제작이 가능하다. 형상제작은 펨토초 레이저를 이용하여 이고아자 흡수 색소가 첨가된 아크릴레이트 계열의 단량체에 이광자 중합반응으로 제작하였으며 선 폭 정밀도는 150 nm 수준이었다. 이광자 광중합법으로 윤곽선을 고화시켜 쉘(shell) 형태로 3차원 형상을 제작할 때에는 기계적 강성이 약하여 고화 후에 용매로 중합반응이 일어나지 않는 부분을 제거할 때 변형이 쉽게 발생하게 된다. 본 연구에서는 이러한 문제점을 해결하고자 윤곽 쉘 두께를 증가시켜 윤곽선을 중첩으로 제작하는 이중 윤곽선 스캐닝 방법(double contour scanning)을 시도하였으며 이를 통하여 제작된 형상의 강도가 향상됨을 확인할 수 있었다.

Keywords: nano-stereolithography process; 3D microstructures; double contour scanning method; two-photon polymerization; femtosecond laser

References
  • 1. Maruo S, Kawata S, J. Microelectromech. Syst., 7, 411 (1998)
  •  
  • 2. Kawata S, Sun HB, Tanaka T, Takada K, Nature, 412, 697 (2001)
  •  
  • 3. Sun HB, Takada T, Kawata S, Appl. Phys. Lett., 79, 3173 (2001)
  •  
  • 4. Sun HB, Takada T, Kawata S, Appl. Phys. Lett., 80, 3673 (2002)
  •  
  • 5. Serbin J, Egbert A, Ostendorf A, Chichkov BN, Opt. Lett., 28, 301 (2003)
  •  
  • 6. Kaneko K, Sun HB, Duan XM, Kawata S, Appl. Phys. Lett., 83, 2091 (2003)
  •  
  • 7. Sun HB, Maeda M, Takada T, Chon JWM, Gu M, Kawata S, Appl. Phys. Lett., 83, 819 (2003)
  •  
  • 8. Park SH, Lim TW, Yang DY, Yi SW, Kong HJThe KSPE Autumn Meeting, 424 (2003)
  •  
  • 9. Yi SW, Lee SK, Kong HJ, Park SH, Jeong CG, Lim TW, Yang DYOptical Society of Korea Summer Meeting, 64, 64 (2003)
  •  
  • 10. Kim DE, Sung IH, Chang WS, Shin BSProc. of Korea-Japan Joint Symposium, 27 (2003)
  •  
  • 11. Piner RD, Zhu J, Xu F, Hong SH, Mirkin CA, Science, 283(5402), 661 (1999)
  •  
  • 12. Pan EY, Pu NW, Tong YP, Yau HF, Appl. Phys. B-Lasers Opt., 77, 485 (2003)
  •  
  • 13. Yi SW, Lee SK, Kong HJ, Park SH, Lim TW, Yang DY, Kim RH, Lee KS, Proc. SPIE, 5342, 137 (2004)
  •  
  • 14. Park SH, Lim TW, Yang DY, Kong HJ, Lee KS, Polym.(Korea), 28(4), 305 (2004)
  •  
  • 15. Park SH, Lim TW, Yang DY, Kong HJ, Kim RH, Lee KS, Bull. Korean Chem. Soc., 25, 1119 (2004)
  •  
  • 16. Park SH, Lim TW, Yang DY, Kong HJ, J. KSPE, 21, 153 (2004)
  •  
  • 17. Maruo S, Nakamura O, Kawata S, Opt. Lett., 22, 132 (1997)
  •  
  • 18. Sun HB, Takada T, Kim MS, Lee KS, Kawata S, Appl. Phys. Lett., 83, 1104 (2003)
  •  
  • 19. Dieck HA, Heck RF, J. Am. Chem. Soc., 96, 1133 (1974)
  •  
  • Polymer(Korea) 폴리머
  • Frequency : Bimonthly(odd)
    ISSN 0379-153X(Print)
    ISSN 2234-8077(Online)
    Abbr. Polym. Korea
  • 2023 Impact Factor : 0.4
  • Indexed in SCIE

This Article

  • 2005; 29(2): 146-150

    Published online Mar 25, 2005

  • Received on Oct 9, 2004
  • Accepted on Jan 20, 2005