Methyl alcohol, which has a poisoning effect in plasma polymerization, was plasma polymerized on KBr substrate at RF discharge power of 25W, pressures of 100, 140, 200, 300, and 540 mTorr and then Its structures were analyzed by means of IR and ESCA. For the comparison, n-Hexane was also plasma polymerized. Depending upon experimental conditions, different phenomenon was observed : at 100 and 540 mTorr, there was no polymeric deposits and much higher O/C ratio was observed compared to that of n-Hexane plasma polymer, while at 140, 200, and 300 mTorr, it was possible to obtain polymeric thin films and lower O/C ratio was observed. These results were interpreted in relation with atomic polymerization concept and bond dissociation energy of methy1 alcohol. It was turned out that oxygen should be excluded during the plasma po1ymerization in order to obtain polymeric thin film effectively.

RF 방전출력 25W, 방전압력 100, 140, 200, 300 및 540mTorr 조건에서 poisoning효과를 나타내는 메틸알코올을 KBr 기질상에 플라즈마중합하여 생성된 박막의 구조와 성분을 적외선 분광기와 ESCA를 이용하여 분석하였고 원자중합 개념을 기본으로 결합해리에너지와 관련하여 박막생성기구를 고찰하였다. 메틸알코올의 플라즈마중합은 산소의 poisoning효과에 의해서 대체로 플라즈마중합이 잘되지 않았으나 반응조건에 따라서 플라즈마중합이 가능하였다. 100, 540 mTorr에서는 플라즈마중합 박막이 샐청되지 않았고 140, 200 및 300 mTorr에서는 플라즈마중합박막을 얻을 수 있었다. 플라즈마중합이 가능한 경우에는 O/C비와 step function값이 낮은 값을 보여주었고 산소가 중합과정에서 배제되어야 효과적으로 중합이 됨을 알 수 있었다. 생성된 박막에는 약 12∼15%의 산소가 포함되어 있었다.

Keywords: plasma polymerization; thin film; poisoning effect