Article
  • Synthesis and Photo-patterning Properties of Negative Type Photo-sensitive Polyimide Copolymers Working at Alkaline Solution

  • Hyo Jin Park, Hae In Shin, Da Jeong Chae, Ji Hyeon Yeo, Ji Eun Gwon, Jun Young Kwon, and Seung Woo Lee†

  • School of Chemical Engineering, Yeungnam University, 280 Daehak-ro, Gyeongsan, Gyeongbuk 38541, Korea

  • 알칼리 수용액에서 현상이 가능한 네거티브 형태의 폴리이미드 공중합체의 합성과 광 형상화 연구

  • 박효진 · 신해인 · 채다정 · 여지현 · 권지은 · 권준영 · 이승우†

  • 영남대학교 화학공학부

  • Reproduction, stored in a retrieval system, or transmitted in any form of any part of this publication is permitted only by written permission from the Polymer Society of Korea.

References
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  • 2. Koyama, Y.; Shoji, Y.; Hashimoto, K.; Masuda, Y.; Araki, H.; Tomikawa, M. Development of Novel Low-Temperature Curable Positive-Tone Photosensitive Dielectric Materials with High Reliability. 2019 IEEE 69th Electronic Components and Technology Conference (ECTC) 2019, 346-351.
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  • 3. Gao, R.; Ma, R.; Li, J.; Su, M.; Hou, F.; Cao, L. Selection and Characterization of Photosensitive Polyimide for Fan-Out Wafer-Level Packaging. IEEE Trans. Compon. Packag. Manuf. Technol. 2021, 12, 368-374.
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  • 4. Lee, S. W.; Kim, J. Y.; Kwon, S. J.; Seo, H. M. Polyimide and Polyimide Composite Films. Polym. Sci. Tech. 2013, 24, 17-24.
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  • 6. Okazaki, M.; Shibasaki, Y.; Ueda, M. New Negative-Type Photosensitive Polyimide Based on Hyperbranched Poly(ether imide), a Cross-Linker, and a Photoacid Generator. Chem. Lett. 2001, 30, 762-763.
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  • 7. Park, Y. J.; Lee, J. H.; Moon, Y. K.; Seo, Y. B.; Kim, Y. H.; Won, J. C.; Kim, J. New Photosensitive Poly(amic acid ester) with BTDA-BBPA Unit: Synthesis, Photopatterning, and Imidization. Polym. Korea 2019, 43, 268-273.
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  • 8. Rubner, R.; Ahne, H.; Kuehn, E.; Kolodziej, G. Photopolymer-The Direct Way to Polyimide Patterns. Photogr. Sci. Eng. 1979, 23, 303-309.
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  • 9. Yoda, N.; Hiramoto, H. New Photosensitive High Temperature Polymers for Electronic Applications. J. Macromol. Sci. A 1984, 21, 1641-1663.
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  • 10. Hsu, S. L.-C.; Lee, P.-I.; King, J.-S.; Jeng, J.-L. Synthesis and Characterization of a Positive-working, Aqueous-base-developable Photosensitive Polyimide Precursor. J. Appl. Polym. Sci. 2002, 86, 352-358.
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  • 11. Nguyen, L. T. T.; Nguyen, H. N.; La, T. H. T. Synthesis and Characterization of a Photosensitive Polyimide Precursor and Its Photocuring Behavior for Lithography Applications. Opt. Mat. 2007, 29, 610-618.
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  • 12. Kang, I. S.; Shin, Y. S.; Lee, Y. J.; Lee, S. W. Synthesis and Characterization of Positive-tone Photo-patternable Poly(benz- oxazole)s: Effect of The Maleic Anhydride End-capper Content. Mol. Cryst. Liq. Cryst. 2020, 707, 66-73.
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  • 13. Shin, Y. S.; Chae, B.; Jung, Y. M.; Lee, S. W. Thermal Imidization Behaviors of 6FDA-ODA Poly(amic acid) Contain- ing Curing Accelerators By In-situ FTIR Spectroscopy. Vib. Spectrosc. 2020, 106, 103007.
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  • 14. Lee, Y. J.; Chae, B.; Park, Y.; Jung, Y. M.; Lee, S. W. 2D Infrared Correlation Study of The Effect of Base Catalyst on Thermal Imidization of Polyamic Acid. J. Mol. Struct. 2020, 1217, 128383.
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  • Polymer(Korea) 폴리머
  • Frequency : Bimonthly(odd)
    ISSN 0379-153X(Print)
    ISSN 2234-8077(Online)
    Abbr. Polym. Korea
  • 2023 Impact Factor : 0.4
  • Indexed in SCIE

This Article

  • 2022; 46(6): 799-804

    Published online Nov 25, 2022

  • 10.7317/pk.2022.46.6.799
  • Received on Jul 20, 2022
  • Revised on Sep 7, 2022
  • Accepted on Sep 13, 2022

Correspondence to

  • Seung Woo Lee

  • School of Chemical Engineering, Yeungnam University, 280 Daehak-ro, Gyeongsan, Gyeongbuk 38541, Korea

  • E-mail: leesw1212@ynu.ac.kr