Article

Preparation of High Transparent and Low Dielectric Constants Resist by Non-aqueous Nano-sized Silica Dispersion for Fabrication of Thin Film
Lee C, Lim Y, Bae JY
비수계 나노 사이즈 실리카 분산을 통한 고투과율·저유전 박막 제조 응용
이창희, 임용찬, 배진영

References

1. Kim SC, Kim YS, Yu EKH, Kanicki J, Solid-State Electron., 111(-), 67 (2015)
2. Lee BD, Park YH, Hwang YT, Oh W, Yoon J, Ree M, Nat. Mater., 4(2), 147 (2005)
3. Lee HJ, Lin EK, Wang H, Wu WL, Chen W, Moyer ES, Chem. Mater., 14, 1845 (2002)
4. Chang TS, Chang TC, Liu PT, Chang TS, Tu CH, Yeh FS, IEEE Electr. Device Lett., 27, 902 (2006)
5. Maier G, Prog. Polym. Sci, 26, 3 (2001)
6. Maex K, Baklanov MR, Shamiryan D, Lacopi F, Brongersma SH, Yanovitskaya ZS, J. Appl. Phys., 93, 8793 (2003)
7. Miller RD, Science, 286, 421 (1999)
8. Cedeno CC, Seekamp J, Kam AP, Hoffmann T, Zankovych S, Torres CMS, Menozzi C, Cavallini M, Murgia M, Ruani G, Biscarini F, Behl M, Zentel R, Ahopelto J, Microelectron. Eng., 25, 61 (2002)
9. Hong WS, Jun KW, Choi JH, Hwang BK, Chung K, IEEE Electr. Device Lett., 25, 381 (2004)
10. Krishnamoorthy A, Spear R, Gebrebrhan A, Stifanos M, Bien H, Lowe M, Yellowaga D, Smith P, O'Rourke S, Loy D, Dailey J, Marrs M, Ageno S, SID Symposium Digest of Technical Papers, 39, 140 (2008)
11. Leao TP, Perfect E, Tyner JS, ASABE, 58, 83 (2015)

Polymer(Korea) 폴리머
Frequency : Bimonthly(odd)
ISSN 0379-153X(Print)
ISSN 2234-8077(Online)
Abbr. Polym. Korea
2023 Impact Factor : 0.4
Indexed in SCIE