Article
  • Preparation and Properties of Water-Soluble Photosensitive Polymer with Azido Group
  • Yoon KB, Lee JT, Han JY, Lee DH
  • Azido기를 함유한 수용성 포토레지스트 제조 및 감광 특성
  • 윤근병, 이준태, 한정엽, 이동호
References
  • 1. Reiser APhotoreactive Polymers; The Science and Technology of Resist, John Wiley & Sons, NewYork (1989)
  •  
  • 2. Ichimura K, Watanabe S, J. Polym. Sci. A: Polym. Chem., 18, 613 (1980)
  •  
  • 3. Ichimura K, Watanabe S, J. Polym. Sci. A: Polym. Chem., 18, 891 (1980)
  •  
  • 4. Ichimura K, J. Polym. Sci. A: Polym. Chem., 20, 1411 (1982)
  •  
  • 5. Ichimura K, Watanabe S, J. Polym. Sci. A: Polym. Chem., 20, 1419 (1982)
  •  
  • 6. Ichimura K, Oohara N, J. Polym. Sci. A: Polym. Chem., 25, 3063 (1987)
  •  
  • 7. Egerton PL, Trigg J, Hyde EM, Reiser A, Macromolecules, 14, 100 (1981)
  •  
  • 8. Reiser A, Pitts E, J. Photogr. Sci., 29, 187 (1981)
  •  
  • 9. Iwayanaki T, Hashimoto M, Nonogaki S, Kobuchi S, Makino D, Polym. Eng. Sci., 23, 935 (1983)
  •  
  • 10. Agaki M, Nonogaki S, Kohashi T, Oba Y, Oikawa M, Tomita Y, Polym. Eng. Sci., 17, 353 (1977)
  •  
  • 11. Kohashi T, Agaki M, Nonogaki S, Hashimoto M, Hayashi N, Tomita Y, Photogr. Sci. Eng., 23, 168 (1979)
  •  
  • 12. Reiser A, Egerton PL, Photogr. Sci. Eng., 23, 144 (1979)
  •  
  • 13. Merrill SH, Unruh CC, J. Appl. Polym. Sci., 7, 273 (1963)
  •  
  • 14. Hoke DI, Surbey DL, Oviatt WR, Macromol. Symp., 6, 95 (1977)
  •  
  • 15. Coleman LE, Bork JF, Wyman DP, Hoke DI, J. Polym. Sci. A: Polym. Chem., 3, 1601 (1965)
  •  
  • 16. Yan M, Cai SX, Wybourne MN, Keana JFW, J. Mater. Chem., 6, 1249 (1996)
  •  
  • Polymer(Korea) 폴리머
  • Frequency : Bimonthly(odd)
    ISSN 0379-153X(Print)
    ISSN 2234-8077(Online)
    Abbr. Polym. Korea
  • 2023 Impact Factor : 0.4
  • Indexed in SCIE

This Article

  • 2007; 31(5): 374-378

    Published online Sep 25, 2007

  • 10.7317/pk.
  • Received on Jan 19, 2007
  • Revised on Nov 30, -0001
  • Accepted on Jul 25, 2007

Correspondence to

  • E-mail: