Article
  • Synthesis and Photochemical Properties of Water Soluble Photosensitive Polymer Based on Poly( vinyl alcohol)
  • Park LS, Han YS
  • 폴리비닐알콜에 감광성기를 도입한 수용성 감광성 고분자의 합성 및 감광특성
  • 박이순, 한윤수
References
  • 1. Patent is pending on part of this paper 특허출원 95-5821
  •  
  • 2. Patent is pending on part of this paper 특허출원 95-5822
  •  
  • 3. Reiser APhotoreactive Polymers; The Science and Technology of Resists, A Wiley-Interscience Publication, New York (1989)
  •  
  • 4. DeForest WSPhotoresist; Materials and Process, Kingsport Press (1975)
  •  
  • 5. Ichimura K, Watanabe S, J. Polym. Sci. C: Polym. Lett., 18, 613 (1982)
  •  
  • 6. Ichimura K, Watanabe S, J. Polym. Sci. A: Polym. Chem., 20, 1419 (1982)
  •  
  • 7. Ichimura K, J. Polym. Sci. A: Polym. Chem., 20, 1411 (1982)
  •  
  • 8. Ichimura K, J. Polym. Sci. A: Polym. Chem., 22, 2817 (1984)
  •  
  • 9. Ichimura KU.S. Patent, 4,269,941 (1981)
  •  
  • 10. 特許出願公開, 昭 55-24126
  •  
  • 11. 特許出願公開, 昭 55-62446
  •  
  • 12. 特許出願公開, 平 2-148536
  •  
  • Polymer(Korea) 폴리머
  • Frequency : Bimonthly(odd)
    ISSN 0379-153X(Print)
    ISSN 2234-8077(Online)
    Abbr. Polym. Korea
  • 2022 Impact Factor : 0.4
  • Indexed in SCIE

This Article

  • 1995; 19(5): 715-721

    Published online Sep 25, 1995

  • 10.7317/pk.
  • Received on Nov 30, -0001
  • Revised on Nov 30, -0001
  • Accepted on Nov 30, -0001

Correspondence to

  • E-mail: