Article
  • Modification of PMMA for a Deep UV Photoresist ; 1. Photodegradation of P(MMA-co-BOXM-co-TBMA)
  • Chae KH, Whang ID, Ahn KD, Park SH
  • 원자외선 포토레지스트로서 PMMA의 개질에 관한 연구; 1. p(MMA-co-BOXM-co-TBMA)의 광분해 반응
  • 채규호, 황인동, 안광덕, 박서호
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  • Polymer(Korea) 폴리머
  • Frequency : Bimonthly(odd)
    ISSN 0379-153X(Print)
    ISSN 2234-8077(Online)
    Abbr. Polym. Korea
  • 2023 Impact Factor : 0.4
  • Indexed in SCIE

This Article

  • 1992; 16(6): 669-679

    Published online Nov 25, 1992

  • 10.7317/pk.
  • Received on Nov 30, -0001
  • Revised on Nov 30, -0001
  • Accepted on Nov 30, -0001

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