Electroconductivity was to be imparted to porous Nylon 6 films by introduing Cu
xS, which is known as p-type semiconductor. Firstly we produced porous structure in the films to distribute Cu
xS into the inside of those films more deeply. The formation conditions and morphology of the porous films were observed and the optimum conditions for inducing Cu
xS into those films were determined. The surface conductivities of Cu
xS treated films were about 10
-1Ω
-1cm and the bulk conductivities of those films were in the range of 10
-8∼10
-6Ω
-1cm
-1 From the results of temperature dependence of conductivities. we can conclude that the conduction characteristics of the surface conductivities mainly depend on electronic conduction. But we also conclude that the bulk conduction of Cu
xS those films is predominated by the thermal properties of the matrix polymer.
다공성 nylon 6 필름에 전기 전도성을 부여하고자 p형 반도체로 알려진 Cu
xS를 도입하였다. 좀더 필름 내부로 Cu
xS를 분산시키기 위해 다공성 구조를 형성하였다. 다공성 필름의 생성 조건 및 형태를 고찰하였고, Cu
xS 도입의 최적 조건을 결정하였다. Cu
xS가 도입된 필름의 표면전도도는 약 10
-1Ω
-1cm
-1정도이고 체적전도도는 10
-8∼10
-6Ω
-1cm
-1정도의 값을 나타내었다. 전도도의 온도 의존성을 측정한 결과로 부터 표면전도도의 전도특성은 주로 electronic한 전도를 따르며 Cu
xS가 도입된 필름의 체적전도도는 체적전도가 모체인 nylon 6의 열적 성질에 의해 지배되기 때문에 ionic한 특성을 나타낸다.
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