Article
  • A Study on Water-based Acrylic Pressure Sensitive Adhesive Using Nonionic Surfactant as Reactive Emulsifier
  • Jung-Won Kim

  • Dept. of Costmetology, Changshin Univ., 262, Paryong-ro, MasanHoiwon-gu, Changwon-si, Gyeongsangnam-do 51352, Korea

  • 비이온 계면활성제를 반응성 유화제로 사용한 수성 아크릴 점착제의 연구
  • 김정원

  • Dept. of Costmetology, Changshin Univ., 262, Paryong-ro, MasanHoiwon-gu, Changwon-si, Gyeongsangnam-do 51352, Korea

Abstract

In this study, a nonionic reactive surfactants with vinyl groups were synthesized by using polyoxyethylene(9) lauryl ether and polyoxyethylene(20) lauryl ether with 3-butenoic acid. The synthesized nonionic reactive surfactants were confirmed by 1H nuclear magnetic resonance (1H NMR) and Fourier transform infrared spectroscopy (FTIR). Using these as a reactive emulsifier, aqueous acrylic adhesives base emulsion was prepared, and the properties of solid content, conversion, particle size distribution, initial adhesion, and adhesion were confirmed. Solid content of adhesives base emulsion was measured 60% and the conversion rate of the emulsion polymerization was to be 99%. The particle size distribution analysis revealed that the size distribution of adhesives base emulsions were 574nm and 698nm. The initial adhesive strength was confirmed by the KS T 1028 test method (Ball-Tack method).


본 연구에서는 polyoxyethylene(9) lauryl ether와 polyoxyethylene(20) lauryl ether를 3-butenoic acid와 반응하여 비닐기를 가진 비이온 반응성 계면활성제를 합성하였다. 합성된 비이온 반응성 계면성활제는 1H NMR과 FTIR로 확인하였다. 이것을 반응성 유화제로 사용하여 수성 아크릴 점착제 베이스 에멀젼을 제조하였으며 고형분, 전환율, 입도분포, 초기접착력, 최대접착력의 물성을 확인하였다. 점착제 베이스 에멀젼의 고형분은 60%이며 에멀젼 중합의 전환율은 99%로 측정되었다. 입도분포의 분석 결과는 574nm와 698nm의 점착제 베이스 에멀젼이 제조되었고 이를 이용하여 제조한 에멀젼 점착제의 경우 초기 접착력은 KS T 1028 시험방법(Ball Tack 시험)으로 확인하였다.


Keywords: nonionic surfactants, reactive emulsifier, adhesive base emulsion, initial adhesion, maximum adhesion

  • Polymer(Korea) 폴리머
  • Frequency : Bimonthly(odd)
    ISSN 0379-153X(Print)
    ISSN 2234-8077(Online)
    Abbr. Polym. Korea
  • 2018 Impact Factor : 0.500
  • Indexed in SCIE

This Article

  • 2021; 45(1): 158-163

    Published online Jan 25, 2021

  • 10.7317/pk.2021.45.1.158
  • Received on Sep 23, 2020
  • Revised on Oct 26, 2020
  • Accepted on Oct 26, 2020

Correspondence to

  • Jung-Won Kim
  • Dept. of Costmetology, Changshin Univ., 262, Paryong-ro, MasanHoiwon-gu, Changwon-si, Gyeongsangnam-do 51352, Korea

  • E-mail: won104@cs.ac.kr