The gamma-ray irradiation chemistry of cctamethyltrisiloxane, decamethyltetrasiloxane, dodecamethylpentasiloxane, hexamethylcyclotrisiloxane and octamethylcyclotetrasiloxane has been studied. Gas and liquid product yields are reported. The mechanism of prcduct formation is rationalized in terms of mass spectrograpic fragmentation patterns.
옥타메틸트리실옥산, 데카메틸테트라실옥산, 도데카메틸펜타실옥산, 헥사메틸시클로트리실옥산과 옥타메틸시클로테트라실옥산의 감마선방사화학을 연구하였다. 기체와 액체 생성물의 수율을 각각 보고하였으며, 생성물 형성의 기구를 질량분광학적 분열 패턴에 의해 규명하였다.
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