Article
  • Plasma Polymerizatin of Organosilicon Compounds : 1. Chemical Structure of Plasma Polymer
  • Park SY, Kim N, Kim UY, Hong SI, Sasabe H
  • 유기실리콘화합물의 플라즈마 중합에 관한 연구: 1. 플라즈마 중합막의 화학구조
  • 박수영, 김낙중, 김은영, 홍성일, Sasabe H
Abstract
Thin organosilicon films were obtained by the plasma polymerization of tetramethylsilane(TMS), hexamethyldisilazane(HMDSIZ), and hexamethyldisiloxane(HMDSIO). The effect of input energy level (W/Fm) on the chemical structure of the plasma polymer was investigated by using FTIR and XPS measurements. The structural characteristics of the plasma polymer were significantly altered by the value of W/Fm (over the range of 107 J/㎏ to l09 J/㎏) . The unique and notable influence of W/Fm on the chemical structure was interpreted in relation to the activation growth mechanism of the plasma polymerization.

테트라메칠실란(TMS), 헥사메칠디실라잔(HMDSIZ), 헥사메칠디실록산(HMDSIO)의 플라즈마 중합에 의한 유기실리콘 박막의 형성에 있어 중합의 에너지 조건 (W/Fm)이 생성박막의 화학구조에 미치는 영향을 FTIR과 XPS 분석에 의해 상세히 검토하였다. 생성박막의 화학구조적 특성은 107 J/㎏-l09 J/㎏ 범위의 W/Fm값 조절에 의해 체계적이고 대폭적인 변화를 보였으며 이러한 화학구조의 변화는 플라즈마 중합의 활성화 성장기구에 의해 설명되었다.

Keywords:

  • Polymer(Korea) 폴리머
  • Frequency : Bimonthly(odd)
    ISSN 0379-153X(Print)
    ISSN 2234-8077(Online)
    Abbr. Polym. Korea
  • 2023 Impact Factor : 0.4
  • Indexed in SCIE

This Article

  • 1992; 16(1): 94-104

    Published online Jan 25, 1992

  • 10.7317/pk.
  • Received on Nov 30, -0001
  • Revised on Nov 30, -0001
  • Accepted on Nov 30, -0001

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